Trade Shows and Forums › By Industry • By Country • By City • By Organizer • By Venue •

Trade Shows and Forums

Trade event venue, organizer, exhibitors and visitors info

SPIE Photomask Technology


Venue:	Monterey Conference Center
Country:	Monterey, United States
Address:	One Portola Plaza, Monterey
Date:	19-09-2011 22-09-2011
Category:	Industrial Goods
Exhibitors:	28+

Description:

The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, mask-making, and wafer fabrication.

Profile:

Coverage Area: 58,000 Square Feet

Visitors: Engineers and designers, Corporate managers from the mask making industry, Application and product developers, Mask and chip designers, Resist chemists, Quality assurance specialists, Experts in mask infrastructure and mask integration, People working in emerging mask technologies are the target visitors.

Exhibitors: Profile for exhibit includes Electron-Beam Lithography, EUV, Metrology, Lasers, Nanotechnology, Optical/Laser Microlithography, Resist Technology and Processing, Software, Electronic Imaging Components.